THE ELECTROCHEMICAL-BEHAVIOR OF NIOBIUM LOW-PRESSURE-PLASMA-SPRAYED COATINGS IN HYDROCHLORIC-ACID

被引：5

作者：

REARDON, JD ^{[1
]}

LONGO, FN ^{[1
]}

CLAYTON, CR ^{[1
]}

DOSS, KGK ^{[1
]}

机构：

[1] SUNY STONY BROOK,DEPT MAT & ENGN,STONY BROOK,NY 11794

来源：

THIN SOLID FILMS | 1983年 / 108卷 / 04期

关键词：

D O I：

10.1016/0040-6090(83)90126-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：459 / 469

页数：11

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