SEMICONDUCTOR DEVICES FABRICATION TECHNIQUES AND PROCESSES CIRCUITS AND APPLICATIONS

被引：0
|
作者：
MARSHALL, S
机构：
来源：
SEMICONDUCTOR PRODUCTS AND SOLID STATE TECHNOLOGY | 1965年 / 8卷 / 05期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：51 / &
相关论文
共 50 条
  • [1] PATENT REVIEW - SEMICONDUCTOR DEVICES FABRICATION TECHNIQUES AND PROCESSES CIRCUITS AND APPLICATIONS
    MARSHALL, S
    [J]. SEMICONDUCTOR PRODUCTS AND SOLID STATE TECHNOLOGY, 1965, 8 (04): : 40 - +
  • [2] SEMICONDUCTOR QUANTUM DEVICES, CIRCUITS, AND APPLICATIONS
    REED, MA
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 202 : 3 - BIOT
  • [3] SEMICONDUCTOR DEVICES TECHNOLOGY CIRCUITS AND APPLICATIONS
    MARSHALL, S
    [J]. SEMICONDUCTOR PRODUCTS AND SOLID STATE TECHNOLOGY, 1965, 8 (01): : 40 - +
  • [4] Thermography techniques for integrated circuits and semiconductor devices
    Liu, Wenjun
    Yang, Bozhi
    [J]. SENSOR REVIEW, 2007, 27 (04) : 298 - 309
  • [5] PLASTIC SEMICONDUCTOR DEVICES AND INTEGRATED CIRCUITS FOR MILITARY APPLICATIONS
    REICH, B
    [J]. SOLID STATE TECHNOLOGY, 1970, 13 (01) : 53 - &
  • [6] FABRICATION OF SEMICONDUCTOR DEVICES EMPLOYING TRANSMUTATION DOPING TECHNIQUES
    KLAHR, CN
    COHEN, MS
    [J]. TRANSACTIONS OF THE AMERICAN NUCLEAR SOCIETY, 1967, 10 (01): : 75 - &
  • [7] CHEMICAL VAPOR DEPOSITION TECHNIQUES FOR FABRICATION OF SEMICONDUCTOR DEVICES
    AMICK, JA
    KERN, W
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (03) : C106 - &
  • [8] SEMICONDUCTOR INTEGRATED CIRCUITS - A REVIEW OF FABRICATION PROCESSES AND COMPONENT CHARACTERISTICS
    KILE, C
    [J]. SEMICONDUCTOR PRODUCTS AND SOLID STATE TECHNOLOGY, 1967, 10 (02): : 30 - &
  • [9] Reactive plasma processes for the fabrication of nano-dimensional semiconductor devices
    Tandon, US
    [J]. SOLID STATE PHENOMENA, 1997, 55 : 167 - 173
  • [10] Nanoscale Semiconductor "X" on Substrate "Y" - Processes, Devices, and Applications
    Madsen, Morten
    Takei, Kuniharu
    Kapadia, Rehan
    Fang, Hui
    Ko, Hyunhyub
    Takahashi, Toshitake
    Ford, Alexandra C.
    Lee, Min Hyung
    Javey, Ali
    [J]. ADVANCED MATERIALS, 2011, 23 (28) : 3115 - 3127
12345