HIGH-PRESSURE X-RAY-DIFFRACTION STUDY OF THOS AND UOSE BY SYNCHROTRON RADIATION

被引：2

作者：

GENSINI, M

GERING, E

BENEDICT, U

GERWARD, L

OLSEN, JS

HULLIGER, F

机构：

[1] TECH UNIV DENMARK,APPL PHYS LAB,DK-2800 LYNGBY,DENMARK

[2] UNIV COPENHAGEN,PHYS LAB,DK-2100 COPENHAGEN,DENMARK

来源：

JOURNAL OF THE LESS-COMMON METALS | 1991年 / 171卷 / 01期

关键词：

D O I：

10.1016/0022-5088(91)90250-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

High-pressure X-ray diffraction studies were performed on ThOS up to 43.3 GPa and on UOSe up to 47.5 GPa, at room temperature, using a diamond anvil cell and synchrotron radiation. The tetragonal structure (P4/nmm) of these compounds was retained over the whole pressure range. The bulk modulus B0 and its pressure derivative B0' were determined for each compound.

引用

页码：L9 / L12

页数：4

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