PLASMA ETCHING OF THIN METAL AND DIELECTRIC FILMS

被引:4
|
作者
BERSIN, RL [1 ]
机构
[1] INT PLASMA CORP,31159 SAN BENITO ST,HAYWARD,CA 94544
来源
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D O I
10.1116/1.568815
中图分类号
O59 [应用物理学];
学科分类号
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页码:169 / 169
页数:1
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