PLASMA ETCHING OF THIN METAL AND DIELECTRIC FILMS

被引：4
|
作者：
BERSIN, RL [1 ]
机构：
[1] INT PLASMA CORP,31159 SAN BENITO ST,HAYWARD,CA 94544
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 01期
关键词：
D O I：
10.1116/1.568815
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：169 / 169
页数：1
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