PREPARATION OF A NOVEL SILICONE-BASED POSITIVE PHOTORESIST AND ITS APPLICATION TO AN IMAGE REVERSAL PROCESS

被引：0
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作者：
TANAKA, A
BAN, H
IMAMURA, S
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来源：
POLYMERS IN MICROLITHOGRAPHY: MATERIALS AND PROCESSES | 1989年 / 412卷
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中图分类号：
O69 [应用化学];
学科分类号：
081704 ;
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页码：175 / 188
页数：14
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