REACTIVE ION ETCHING

被引：0

作者：

ZIELINSKI, L ^{[1
]}

SCHWARTZ, GC ^{[1
]}

机构：

[1] IBM CORP,SYST PROD DIV,E FISHKILL FACIL,HOPEWELL JCT,NY 12533

来源：

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C71 / C71

页数：1

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