N+ AND P+ SUBSTRATE EFFECTS ON EPITAXIAL SILICON PROPERTIES

被引：0
|
作者：
DYSON, W [1 ]
ROSSI, JA [1 ]
HELLWIG, LG [1 ]
MOODY, JW [1 ]
机构：
[1] MONSANTO ELECTR MAT CO,ST PETERS,MO 63376
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C95 / C95
页数：1
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