CONTACT RESISTANCE OF SUPERCONDUCTOR-SEMICONDUCTOR INTERFACES - THE CASE OF NB-INAS/ALSB QUANTUM-WELL STRUCTURES

被引:32
|
作者
NGUYEN, C
KROEMER, H
HU, EL
机构
[1] Department of Electrical and Computer Engineering, University of California, Santa Barbara
关键词
D O I
10.1063/1.113047
中图分类号
O59 [应用物理学];
学科分类号
摘要
The contact resistances of widely spaced (much greater than 1 mum) superconducting Nb contacts to InAs-AlSb quantum wells indicate a resistive behavior of the interface, with a positive electron transfer length, while narrow-spaced contacts (less-than-or-equal-to 1 mum) exhibit a strong conductance enhancement at low bias with pronounced subgap features. The data are interpreted in terms of a model in which the current across the interface is carried by Andreev reflections. From the measured transfer lengths, we estimate a single-event Andreev reflection probability of about 3.5%, but with a high backplane-enhanced overall reflection probability.
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页码:103 / 105
页数:3
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