THE EFFECTS OF DEPOSITION VARIABLES ON THE ELECTRICAL-PROPERTIES OF SILICON-NITRIDE FILMS BY CHEMICAL VAPOR-DEPOSITION

被引：1
|
作者：
YI, KS
PARK, HL
CHUN, JS
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 06期
关键词：
D O I：
10.1116/1.573632
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：3082 / 3084
页数：3
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