INVESTIGATION OF THE ELECTRONIC-STRUCTURES AND ASSOCIATED PROPERTIES INCLUDING HYPERFINE INTERACTIONS FOR HALOGEN-ADSORBED SILICON SURFACES - FLUORINE THROUGH IODINE

被引：30
|
作者：
MOHAPATRA, SM
DEV, BN
MISHRA, KC
SAHOO, N
GIBSON, WM
DAS, TP
机构：
来源：
PHYSICAL REVIEW B | 1988年 / 38卷 / 17期
关键词：
D O I：
10.1103/PhysRevB.38.12556
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：12556 / 12566
页数：11
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