PHOTOCHEMISTRY OF AZIDE-PHENOLIC RESIN PHOTORESISTS

被引：9
|
作者：
HASHIMOTO, M
IWAYANAGI, T
SHIRAISHI, H
NONOGAKI, S
机构：
来源：
POLYMER ENGINEERING AND SCIENCE | 1986年 / 26卷 / 16期
关键词：
D O I：
10.1002/pen.760261603
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
引用
收藏
页码：1090 / 1095
页数：6
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