ION KINETICS IN COLLISIONAL RF-GLOW DISCHARGE SHEATHS

被引:28
|
作者
ZEUNER, M
MEICHSNER, J
机构
[1] Chemnitz University of Technology, Department of Physics, 09009 Chemnitz
关键词
D O I
10.1016/0042-207X(94)E0030-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ion kinetic investigations are performed on a 27.12 MHz capacitively coupled parallel plate discharge configuration using argon and oxygen as the process gases. The incident ions on the grounded electrode are separated, according to their mass and energy, and the influence of rf-power density and fetal pressure on the ion mass spectra and, especially, on the ion energy distribution are discussed. In the observed parameter range, a transition from space charge-limited to mobility limited ion transport in the plasma sheath occurs. The ion sheath thickness can be calculated from the change of the shape of the energy distribution with pressure.
引用
收藏
页码:151 / 157
页数:7
相关论文
共 50 条
  • [1] Numerical study on collision-less plasma sheaths of RF-glow discharge
    Wang, Xiaodong
    Zhang, Haiming
    Lin, Zeng
    Lv, Shaobo
    Ba, Dechun
    18TH INTERNATIONAL VACUUM CONGRESS (IVC-18), 2012, 32 : 930 - 937
  • [2] ION KINETICS IN LOW-PRESSURE, ELECTROPOSITIVE, RF GLOW-DISCHARGE SHEATHS
    BARNES, MS
    FORSTER, JC
    KELLER, JH
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (02) : 240 - 244
  • [3] QUANTITATIVE-ANALYSIS WITH DC-GLOW AND RF-GLOW DISCHARGE SPECTROMETRY
    PAYLING, R
    JONES, DG
    GOWER, SA
    SURFACE AND INTERFACE ANALYSIS, 1993, 20 (12) : 959 - 966
  • [4] Characterisation of a pulsed rf-glow discharge in view of its use in OES
    Nelis, T
    Aeberhard, M
    Hohl, M
    Rohr, L
    Michler, J
    JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY, 2006, 21 (02) : 112 - 125
  • [5] Studies of gas-jet assisted RF-glow discharge atomic absorption spectrometry
    Choi, SK
    Kim, HJ
    FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY, 1996, 355 (3-4): : 308 - 311
  • [6] THE DIFFERENT ROLES OF NITROGEN IN RF-SPUTTERED AND RF-GLOW DISCHARGE HYDROGENATED AMORPHOUS-SILICON
    SMITH, GJ
    MILNE, WI
    PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1983, 47 (04): : 419 - 429
  • [7] On the uniformity of thin a-Si:H films prepared in an RF-Glow discharge system
    Myburg, G.
    Swanepoel, R.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1988, 27 pt 1 (06): : 899 - 907
  • [8] Pressure influence on the depth resolution of rf-glow discharge depth profiling of multilayer coatings
    Hodoroaba, VD
    Wirth, T
    JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY, 1999, 14 (09) : 1533 - 1535
  • [9] ON THE UNIFORMITY OF THIN A-SI-H FILMS PREPARED IN AN RF-GLOW DISCHARGE SYSTEM
    MYBURG, G
    SWANEPOEL, R
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1988, 27 (06): : 899 - 907