SURFACE CHARACTERIZATION OF NITROGEN-ION-IMPLANTED ETCHED AND POLISHED AISI-316 STAINLESS-STEEL

被引：7
|
作者：
AGGARWAL, S
GOEL, AK
MOHINDRA, RK
GHOSH, PK
BHATNAGAR, MC
机构：
[1] UNIV ROORKEE,DEPT MECH & IND ENGN,WELDING RES LAB,ROORKEE 247667,UTTAR PRADESH,INDIA
[2] INDIAN INST TECHNOL,THIN FILMS LAB,NEW DELHI 110016,DELHI,INDIA
来源：
THIN SOLID FILMS | 1994年 / 237卷 / 1-2期
关键词：
D O I：
10.1016/0040-6090(94)90257-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The influence of nitrogen ion implantation on the surface characteristics of AISI 316 stainless steel has been examined on two different surfaces of the substrate: strain-induced (mechanically polished) and excess-strain-free (chemically etched) surfaces. Samples were implanted with 2.5 x 10(21) N-2(+) m(-2) at 130 keV. The characteristics of the implanted layer and depth profile were investigated by Auger electron spectroscopy and X-ray photoelectron spectroscopy. The indentification of the phase change and compounds formed was studied by glancing-angle X-ray diffraction. No phase transformation from the gamma-austenite phase was observed as a result of mechanical polishing and after implantation. The formation of Cr2N is observed in both surfaces with some epsilon-Fe2N-Fe3N on the polished surface only. The surface hardness is found to be enhanced after implantation in both these cases and its dependence is discussed with respect to the changes observed after implantation.
引用
收藏
页码：175 / 180
页数：6
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