BARRIER BEHAVIOR OF TIW BETWEEN COPPER AND ALUMINUM

被引:6
|
作者
KRAUTZ, H
WENZEL, C
BORNKESSEL, K
BLASEK, G
机构
来源
关键词
D O I
10.1002/pssa.2211100246
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:K77 / K79
页数:3
相关论文
共 50 条
  • [1] Barrier behaviour of TiW between copper and aluminium
    Krautz, H.
    Wenzel, Ch.
    Bornkessel, K.
    Blasek, G.
    Physica Status Solidi (A) Applied Research, 1988, 110 (02):
  • [2] DIFFUSION BARRIER PROPERTIES OF TIW BETWEEN SI AND CU
    WANG, SQ
    SUTHAR, S
    HOEFLICH, C
    BURROW, BJ
    JOURNAL OF APPLIED PHYSICS, 1993, 73 (05) : 2301 - 2320
  • [3] THE EFFECT OF SI AND CU ON THE INTERACTIONS BETWEEN AL FILMS AND A TIW BARRIER LAYER
    CHANG, PH
    CHEN, HM
    LIU, HY
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (07) : 2739 - 2742
  • [4] COMPARATIVE-STUDY OF NB AND TIW BARRIER LAYERS BETWEEN AU AND A-SIO2
    LIEHR, M
    DELRUE, JP
    CAUDANO, R
    HERBOTS, N
    VANDENBERGHE, RAL
    VLAEMINCK, R
    LOOS, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 288 - 291
  • [5] Effects of Al pad deformation and TiW barrier layer on copper-to-silicon diffusion and intermetallic compound formation in copper wire bonding
    Zhang, Shawn
    Chen, Catherine
    Lee, Ricky
    Lau, Angie K. M.
    Tsang, Paul P. H.
    Mohamed, Lebbai
    Chan, C. Y.
    Dirkzwager, M.
    IEEE CPMT: INTERNATIONAL SYMPOSIUM AND EXHIBITION ON ADVANCED PACKAGING MATERIALS: PROCESSES, PROPERTIES AND INTERFACES, 2006, : 189 - +
  • [6] Fracture Behavior of Functionally Graded Joint Interfaces Between Copper and Aluminum at Nano-Scale
    Wang, Xuanping
    Wang, Lei
    Guo, Linkai
    JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE, 2015, 12 (08) : 1944 - 1950
  • [7] TANTALUM AS A DIFFUSION BARRIER BETWEEN COPPER AND SILICON
    HOLLOWAY, K
    FRYER, PM
    APPLIED PHYSICS LETTERS, 1990, 57 (17) : 1736 - 1738
  • [8] Copper Electromigration Improvement Through Aluminum Barrier and Related Process Optimization
    Sahoo, P. B.
    Hadi, Harri Dharma
    Afiq, Amirul
    Xie Jun
    Zheng, Peck Yan
    Huang Daiyu
    Hian, Tan Tze
    Yee, Chong Chia
    2024 35TH ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE, ASMC, 2024,
  • [9] Nucleation of copper on TiW and TiN during chemical vapor deposition
    Do-Heyoung, Kim
    Wentorf, Robert H. Jr.
    Gill, William N.
    Journal of Applied Physics, 1993, 74 (08):
  • [10] Corrosion and degradation behavior of aluminum and copper refrigerant piping
    Uchiyama, Seiji
    Uemura, Satoshi
    Hiraoka, Koji
    Kimura, Yuji
    Seki, Shiro
    MATERIALS AND CORROSION-WERKSTOFFE UND KORROSION, 2023, 74 (03): : 344 - 351