ISLAND-SIZE SCALING IN SURFACE DEPOSITION PROCESSES

被引：60
|
作者：
BARTELT, MC
TRINGIDES, MC
EVANS, JW
机构：
[1] IOWA STATE UNIV SCI & TECHNOL,AMES LAB,AMES,IA 50011
[2] IOWA STATE UNIV SCI & TECHNOL,DEPT PHYS,AMES,IA 50011
[3] IOWA STATE UNIV SCI & TECHNOL,DEPT MATH,AMES,IA 50011
来源：
PHYSICAL REVIEW B | 1993年 / 47卷 / 20期
关键词：
D O I：
10.1103/PhysRevB.47.13891
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Diffusion-mediated nucleation and growth of islands during deposition occurs essentially irreversibly in a variety of systems. We provide a scaling theory for the full island-size distribution, both with the ratio of surface diffusion to deposition rates and with time. Scaling functions and exponents are determined by simulation and explained analytically by an unconventional rate-equation analysis. Experimental tests for theoretical predictions are discussed, including the scaling of superlattice beam profiles for diffraction studies of heteroepitaxial systems.
引用
收藏
页码：13891 / 13894
页数：4
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