FILM MODEL FOR SULFUR-DIOXIDE ABSORPTION INTO QUIESCENT WATER WITH INTERFACIAL RESISTANCE

A film model for sulfur dioxide absorption into quiescent water with an equilibrium chemical reaction, taking into consideration the effect of the interfacial resistance, is presented. A closed-form solution has been obtained. The results indicate that the interfacial resistance significantly reduces the absorption rate. For a sensitivity analysis, an equilibrium chemical reaction with a higher value of equilibrium rate constant would result in a greater reduction of the absorption rate. The effect of the interfacial resistance dominates in the region with the small values of 4 D(A)/pik(L)2. This analysis could be of importance for the SO2 removal in the situations where impurities contaminate the gas-liquid interface inducing an interfacial resistance effect. Also, the film model avoids the time dependence and thus is much easier to apply than the penetration model. The present results of the film model are in satisfactory agreement with the experimental data. For the special case with no interfacial resistance effect, the present solution reduces to a previous work of other investigators.