DEPOSITION OF AG ON SI(100) SURFACES AS STUDIED BY LEED-AES

被引：26
|
作者：
HANAWA, T [1 ]
OURA, K [1 ]
机构：
[1] OSAKA UNIV,FAC ENGN,ELECTRON BEAM LAB,SUITA,OSAKA 565,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1977年 / 16卷 / 03期
关键词：
D O I：
10.1143/JJAP.16.519
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：519 / 520
页数：2
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