DEGRADATION OF THIN TELLURIUM-FILMS

被引：33
|
作者：
LEE, WY
GEISS, RH
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 03期
关键词：
D O I：
10.1063/1.332156
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：1351 / 1357
页数：7
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