HIGHLY SENSITIVE NOVOLAK-BASED X-RAY POSITIVE RESIST

被引：10
|
作者：
LINGNAU, J
DAMMEL, R
THEIS, J
机构：
来源：
POLYMER ENGINEERING AND SCIENCE | 1989年 / 29卷 / 13期
关键词：
D O I：
10.1002/pen.760291309
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
引用
收藏
页码：874 / 877
页数：4
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