MHD Stagnation Point Flow of Williamson Nanofluid Over an Exponentially Inclined Stretching Surface with Thermal Radiation and Viscous Dissipation

An analysis of MHD stagnation point flow of Williamson nanofluid over an exponentially inclined stretching surface in the presence of thermal radiation and viscous dissipation. Velocity, thermal and solutalslips are considered instead of no-slip conditions at the boundary. The governing system of partial differential equations is transformed into a system of ordinary differential equations using similarity transformations and then solved numerically using the Runge-Kutta fourth order along with shooting technique. The effects of the various parameters on the velocity, temperature and concentration profiles are illustrated graphically and discussed in detail. The influence of the slip parameters causes significant fluctuations in velocity of the flow field.