EVIDENCE FOR PHOTOACTIVATED DEFECT INDUCED DIELECTRIC ANOMALIES IN CUCL

被引：3
|
作者：
LEFKOWITZ, I
ESTES, WE
HATFIELD, WE
BLOOMFIELD, PE
机构：
[1] UNIV N CAROLINA,DEPT PHYS,CHAPEL HILL,NC 27514
[2] USA,RES OFF,RES TRIANGLE PK,NC 27709
[3] CUNY HUNTER COLL,NEW YORK,NY 10021
[4] UNIV N CAROLINA,DEPT CHEM,CHAPEL HILL,NC 27514
[5] PENNWALT CORP,CTR TECHNOL,KING OF PRUSSIA,PA 19406
来源：
FERROELECTRICS | 1987年 / 73卷 / 3-4期
关键词：
D O I：
10.1080/00150198708227943
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：487 / 492
页数：6
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