MAGNETORESISTANCE IN ELECTRODEPOSITED NI-FE-CU/CU MULTILAYERS

被引：43
|
作者：
ATTENBOROUGH, K [1 ]
HART, R [1 ]
LANE, SJ [1 ]
ALPER, M [1 ]
SCHWARZACHER, W [1 ]
机构：
[1] UNIV BRISTOL,DEPT GEOL,BRISTOL BS8 1RJ,AVON,ENGLAND
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1995年 / 148卷 / 1-2期
基金：
英国工程与自然科学研究理事会;
关键词：
D O I：
10.1016/0304-8853(95)89007-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Multilayers of Ni-Fe-Cu/Cu have been electrodeposited from a single electrolyte onto polycrystalline (100) textured and (100) single crystal copper substrates. Bilayer thicknesses as low as 30 Angstrom have been achieved, as confirmed by X-ray diffraction. Room temperature magnetoresistance measurements show the presence of giant magnetoresistance (GMR) and an anisotropic magnetoresistance (AMR) component in the films.
引用
收藏
页码：335 / 336
页数：2
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