RF DIODE SPUTTERED PLATINUM FILMS

被引:12
|
作者
MURARKA, SP [1 ]
机构
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
关键词
D O I
10.1016/0040-6090(74)90016-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:323 / 336
页数:14
相关论文
共 50 条
  • [1] Characterization of rf-sputtered platinum films by positron annihilation spectroscopy
    Brauer, G
    Anwand, W
    Nicht, EM
    Kuriplach, J
    Procházka, I
    Becvár, F
    Osipowicz, A
    Coleman, PG
    [J]. PHYSICAL REVIEW B, 2000, 62 (08): : 5199 - 5206
  • [2] RF DIODE SPUTTERED ZNO TRANSDUCERS
    LARSON, JD
    WINSLOW, DK
    ZITELLI, LT
    [J]. IEEE TRANSACTIONS ON SONICS AND ULTRASONICS, 1972, SU19 (01): : 18 - &
  • [3] MICROSTRUCTURE AND STABILITY OF RF-DIODE SPUTTERED GDTBFECO THIN-FILMS
    SHIEH, HPD
    HONG, M
    NAKAHARA, S
    [J]. JOURNAL OF APPLIED PHYSICS, 1988, 63 (08) : 3627 - 3629
  • [4] DETECTION OF PINHOLES IN RF-DIODE-SPUTTERED SIO2-FILMS
    HATTORI, T
    UTSUGI, Y
    YAMAUCHI, H
    [J]. THIN SOLID FILMS, 1982, 97 (03) : 231 - 235
  • [5] STEP COVERAGE OF RF-DIODE-SPUTTERED SIO2-FILMS
    SERIKAWA, T
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (02): : 582 - 586
  • [6] DETECTION OF PINHOLES IN RF-DIODE-SPUTTERED SIO2-FILMS
    HATTORI, T
    UTSUGI, Y
    [J]. THIN SOLID FILMS, 1982, 89 (01) : 102 - 102
  • [7] RF SPUTTERED DIELECTRIC FILMS
    PENNEBAK.WB
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (08) : C294 - &
  • [8] THE EFFECTS OF DEPOSITION PARAMETERS ON IRON FILMS RF DIODE SPUTTERED IN ARGON-NITROGEN
    JONES, RE
    WILLIAMS, J
    STAUD, N
    [J]. IEEE TRANSACTIONS ON MAGNETICS, 1990, 26 (05) : 1456 - 1458
  • [9] POROSITY IN SPUTTERED PLATINUM FILMS
    WESTWOOD, WD
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 466 - 471
  • [10] Optical waveguiding properties of RF diode sputtered LiNbO3 thin films
    Tomar, M
    Mehan, N
    Sreenivas, K
    Mansingh, A
    [J]. FERROELECTRICS, 2005, 329 : 965 - 968