EXTRACTION OF CHANNEL LENGTH AND JUNCTION VOLTAGE IN N+/N/N+ OR N+/P/N+ POLYSILICON RESISTORS

被引:2
|
作者
RODDER, M
MADAN, SK
机构
[1] Semiconductor Process and Design Center, Texas Instruments, Inc., Dallas, TX
关键词
D O I
10.1109/16.144692
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A method for extraction of channel length and junction voltage of poly-Si resistors is presented. Direct extraction of channel length can be performed for n+/n/n+ resistors operating in the nonlinear I-V regime. However, poly-Si resistors may have channel doping opposite to that of the source/drain doping. For this case, a method is presented for extraction of the current-dependent voltage drop across the drain n+/p junction. Importantly, this junction voltage drop can be an appreciable fraction of the drain-to-source bias and thus is important for correct analysis of n+/p/n+ resistors.
引用
收藏
页码:1968 / 1970
页数:3
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