AUTOMATIC EXPOSURE CONTROL FOR DUPLICATE FILM PROCESSING

被引：0

|

作者：

LYON, R ^{[1
]}

WAKEMAN, R ^{[1
]}

机构：

[1] FAIRCHILD SPACE & DEF SYST,SYOSSET,NY 11791

来源：

PHOTOGRAMMETRIC ENGINEERING AND REMOTE SENSING | 1975年 / 41卷 / 06期

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D O I：

暂无

中图分类号：

P9 [自然地理学];

学科分类号：

0705 ; 070501 ;

摘要：

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页码：779 / 780

页数：2

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