FORMATION OF AMORPHOUS AL-TRANSITION METAL (TM - FE, CO, NI) BINARY ALLOY-FILMS BY RF-SPUTTERING

被引:17
|
作者
MASUI, K
MARUNO, S
SAKAKIBARA, S
KAWAGUCHI, T
机构
[1] Nagoya Inst of Technology, Materials, Research Lab, Nagoya, Jpn, Nagoya Inst of Technology, Materials Research Lab, Nagoya, Jpn
关键词
ALUMINUM COBALT ALLOYS - Amorphous - ALUMINUM IRON ALLOYS - Amorphous - ALUMINUM NICKEL ALLOYS - Amorphous - GLASS; METALLIC - Thin Films - PROTECTIVE COATINGS - Sputtering;
D O I
10.1016/0022-3093(85)90074-2
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A new type Al-TM amorphous alloy was produced by rf-sputtering under Ar atmosphere. The existence of the amorphous phase was confirmed by X-ray diffraction, transmission electron microscopy, calorimetric and electrical resistivity measurements. It was found that the amorphous phase is formed in the limited composition range of about 75 to 90 at. % Al and the formation of the amorphous phase in such a limited composition range is closely associated with the existence of several intermetallic compounds (Fe//4Al//1//3, FeAl//6, Co//4Al//1//3, Co//2Al//9, NiAl//3) in nearly the same composition range having a crystallographically complex structure. The crystallization temperatures of the amorphous alloys are 360 degree C, 260 degree C and 220 degree C for Al-Fe, Al-Co and Al-Ni alloys, respectively.
引用
收藏
页码:271 / 284
页数:14
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