X-RAY-SCATTERING STUDIES OF THE SI-SIO2 INTERFACE

被引：91
|
作者：
FUOSS, PH
NORTON, LJ
BRENNAN, S
FISCHERCOLBRIE, A
机构：
[1] STANFORD UNIV,SYNCHROTRON RADIAT LAB,STANFORD,CA 94305
[2] HEWLETT PACKARD LABS,PALO ALTO,CA 94303
来源：
PHYSICAL REVIEW LETTERS | 1988年 / 60卷 / 07期
关键词：
D O I：
10.1103/PhysRevLett.60.600
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：600 / 603
页数：4
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