ROLE OF DC BIAS IN RF SPUTTERING PROCESS OF AMORPHOUS GD-CO FILMS

被引：7
|
作者：
HIRANO, M
KATAYAMA, T
KOIZUMI, Y
KAWAKAMI, M
TSUSHIMA, T
机构：
[1] ELECTROTECH LAB,TANASHI,TOKYO 188,JAPAN
[2] TOKYO ELECT ENGN COLL,CHIYODA KU,TOKYO 101,JAPAN
[3] NIHON UNIV,CHIYODA KU,TOKYO 101,JAPAN
来源：
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN | 1977年 / 42卷 / 01期
关键词：
D O I：
10.1143/JPSJ.42.347
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：347 / 348
页数：2
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