MODELING AND MEASUREMENT OF SUBMICRON PARTICLES IN RF PLASMAS IN AR

被引：2

作者：

HOSOKAWA, Y ^{[1
]}

KITAJIMA, T ^{[1
]}

MAKABE, T ^{[1
]}

机构：

[1] KOBE STEEL LTD,MECH ENGN RES LAB,KOBE,JAPAN

来源：

AUSTRALIAN JOURNAL OF PHYSICS | 1995年 / 48卷 / 03期

关键词：

D O I：

10.1071/PH950439

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The work is focused on the growth and transport of submicron particles in nonreactive radiofrequency plasma in Ar at 13.56 MHz, studied by numerical modeling using the relaxation continuum model, and by experiment using spatiotemporally resolved optical emission spectroscopy with Mie scattering. The particle growth/decay under conditions of the initially injected (CF2)(n), and the related spatiotemporal change of the rf plasma structure, are discussed in terms of their numerical and experimental results. The results give suggestions with respect to the influence of particles in a dusty rf plasma system; such as dry etching and sputtering.

引用

页码：439 / 452

页数：14

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