H-2-F-2 CHEMICAL-LASER INITIATED BY AN EXCIMER FLASHLAMP

被引：0
|
作者：
GORDON, EB
MATYUSHENKO, VI
PAVLENKO, VS
SIZOV, VD
机构：
来源：
KVANTOVAYA ELEKTRONIKA | 1985年 / 12卷 / 01期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：220 / 223
页数：4
相关论文
共 50 条
  • [1] STUDY OF A FLASHLAMP-INITIATED LARGE-VOLUME H2-F2 CHEMICAL-LASER
    BASHKIN, AS
    VAGIN, NP
    NAZYROV, OR
    ORAEVSKII, AN
    PAZYUK, VS
    PORODINKOV, OE
    YURYSHEV, NN
    [J]. KVANTOVAYA ELEKTRONIKA, 1980, 7 (08): : 1821 - 1823
  • [2] CHARACTERISTICS OF A PULSED CHEMICAL-LASER UTILIZING H-2-F-2 MIXTURE AND INITIATED BY THE EXIMER XECL LASER-RADIATION
    GORDON, EB
    MATYUSHENKO, VI
    SIZOV, VD
    [J]. KVANTOVAYA ELEKTRONIKA, 1982, 9 (11): : 2186 - 2192
  • [3] PULSED-DISCHARGE INITIATED H-2-F-2 CHEMICAL-LASER - EXPERIMENTAL COMPARISON WITH NONCHAIN H-2-SF6 LASER
    MORIMOTO, M
    OBARA, M
    FUJIOKA, T
    [J]. ELECTRICAL ENGINEERING IN JAPAN, 1978, 98 (03) : 107 - 111
  • [4] A HIGH-EFFICIENCY ELECTRIC-DISCHARGE H-2-F-2 CHEMICAL-LASER
    GORDON, EB
    GOROKHOV, VV
    MATYUSHENKO, VI
    KARELIN, VI
    PAVLOVSKII, AI
    REPIN, PB
    SIZOV, VD
    [J]. KVANTOVAYA ELEKTRONIKA, 1986, 13 (12): : 2534 - 2535
  • [5] EFFICIENT EXCIMER-FLASHLAMP INITIATED PULSED HF-DF CHEMICAL-LASER
    LIND, RC
    RENSCH, DB
    STEPHENS, RR
    [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1977, 13 (09) : D27 - D27
  • [6] HF CHEMICAL-LASER INITIATED BY AN EXCIMER XECL LASER
    BORISOV, VM
    GORDON, EB
    MATYUSHENKO, VI
    SIZOV, VD
    KHRISTOFOROV, OB
    [J]. KVANTOVAYA ELEKTRONIKA, 1982, 9 (02): : 434 - 436
  • [7] PARAMETRIC ANALYSIS OF PULSED H-2-F-2 LASER
    AGROSKIN, VY
    VASILIEV, GK
    KIRYANOV, VI
    TALROZE, VL
    [J]. KVANTOVAYA ELEKTRONIKA, 1976, 3 (09): : 1932 - 1940
  • [8] AN H2(D2)-F2 CHEMICAL-LASER INITIATED WITH A NOVEL TEFLON SURFACE SPARK UV FLASH
    WATANABE, K
    SATO, Y
    OBARA, M
    FUJIOKA, T
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (11) : 2175 - 2180
  • [9] A HIGH-EFFICIENCY HF(H2/F2) CHEMICAL-LASER INITIATED WITH A SURFACE-SPARK ULTRAVIOLET FLASH
    HOKAZONO, H
    HISHINUMA, K
    WATANABE, K
    OBARA, M
    FUJIOKA, T
    [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) : 1359 - 1363
  • [10] EFFECT OF ROTATIONAL RELAXATION RATE ON OPERATION OF A PULSED H2+F2 CHEMICAL-LASER
    VASILIEV, GK
    MAKAROV, EF
    RYABENKO, AG
    TALROZE, VL
    [J]. ZHURNAL EKSPERIMENTALNOI I TEORETICHESKOI FIZIKI, 1976, 71 (10): : 1320 - 1326
12345