ANALYSIS OF FEF3 AND NIF2 THIN-FILMS BY USING RBS, (ALPHA, X) REACTIONS, AND SIMS MEASUREMENTS

被引：19
|
作者：
GEVERS, G
BARRIERE, AS
GRANNEC, J
LOZANO, L
BLANCHARD, B
机构：
[1] CNRS,CHIM SOLIDE LAB,F-33405 TALENCE,FRANCE
[2] CEN GRENOBLE,SEAPC,F-38401 GRENOBLE,FRANCE
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1984年 / 81卷 / 01期
关键词：
D O I：
10.1002/pssa.2210810110
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：105 / 122
页数：18
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