OPTIMIZATION OF THE PLASMA-CVD PROCESS FOR HARD COATINGS BY MEANS OF OPTICAL-EMISSION SPECTROSCOPY

被引：7
|
作者：
RIE, KT
GEBAUER, A
WOHLE, J
机构：
来源：
MATERIALWISSENSCHAFT UND WERKSTOFFTECHNIK | 1993年 / 24卷 / 3-4期
关键词：
D O I：
10.1002/mawe.19930240310
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The deposition of titanium nitride layers by pulsed-DC-PA-CVD was investigated by optical emission spectroscopy Ti+ and N2+ were controlling factors for layer growth. An occurrence of TiN in the gas phase for higher plasma power deteriorates the layer properties, such as hardness. The analysis of the chemical composition of the layers shows a contrary behaviour of nitrogen and chlorine. The chlorine content affects the hardness of the layers. Chlorine was detected in the discharge in atomic form. No titanium chlorides could be detected. The morphology of the crystal growth is dependent on the deposition parameters.
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页码：120 / 124
页数：5
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