SELECTIVE SPUTTER-ETCHING OF SIO2 AND SI3N4

被引：0
|
作者：
KUROGI, Y [1 ]
TAJIMA, M [1 ]
MORI, K [1 ]
SUGIBUCHI, K [1 ]
机构：
[1] NIPPON ELECTR CO LTD,CENT RES LABS,KAWASAKI,KANAGAWA 213,JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C284 / C284
页数：1
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