CHARACTERIZATION OF MONOLITHIC POLYCRYSTALLINE-SILICON RESISTORS IN SUB-MICRON THICKNESS

被引:0
|
作者
LU, NCC
LU, CY
LEE, MK
SHIH, CC
WANG, CS
SHENG, TT
REUTER, W
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
[2] NATL CHIAO TUNG UNIV,INST CYTOL & GENET,HSINCHU,TAIWAN
[3] BELL TEL LABS INC,MURRAY HILL,NJ 07974
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:C331 / C331
页数:1
相关论文
共 50 条
  • [1] SCALING LIMITATIONS OF MONOLITHIC POLYCRYSTALLINE-SILICON RESISTORS IN VLSI STATIC RAMS AND LOGIC
    LU, NCC
    GERZBERG, L
    MEINDL, JD
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (04) : 682 - 690
  • [2] ON THE RESISTANCE SWITCHING IN POLYCRYSTALLINE-SILICON RESISTORS
    LU, CY
    LU, NCC
    SHIH, CC
    LEE, MK
    WANG, CS
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (03) : C100 - C100
  • [3] Effects of mechanical stress on polycrystalline-silicon resistors
    Nakabayashi, M
    Ohyama, H
    Simoen, E
    Ikegami, M
    Claeys, C
    Kobayashi, K
    Yoneoka, M
    Miyahara, K
    THIN SOLID FILMS, 2002, 406 (1-2) : 195 - 199
  • [4] MONOLITHIC POLYCRYSTALLINE-SILICON PRESSURE TRANSDUCER
    JAFFE, JM
    ELECTRONICS LETTERS, 1974, 10 (20) : 420 - 421
  • [5] Mechanical stress of the electrical performance of polycrystalline-silicon resistors
    N. Nakabayashi
    H. Ohyama
    E. Simoen
    M. Ikegami
    C. Claeys
    K. Kobayashi
    M. Yoneoka
    K. Miyahara
    Journal of Materials Research, 2001, 16 : 2579 - 2582
  • [6] Mechanical stress of the electrical performance of polycrystalline-silicon resistors
    Nakabayashi, N
    Ohyama, H
    Simoen, E
    Ikegami, M
    Claeys, C
    Kobayashi, K
    Yoneoka, M
    Miyahara, K
    JOURNAL OF MATERIALS RESEARCH, 2001, 16 (09) : 2579 - 2582
  • [7] Fracture mechanism of metallic film with nano to sub-micron thickness on polycrystalline substrate
    Li, Chuanzheng
    Zhang, Di
    Xu, Zhutian
    Wang, Jilai
    Yang, Yong
    Peng, Linfa
    Lai, Xinmin
    SCRIPTA MATERIALIA, 2024, 252
  • [8] SCALING AND LIMITS OF MONOLITHIC POLYCRYSTALLINE SILICON RESISTORS
    GERZBERG, L
    LU, NCC
    MEINDL, JD
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (11) : 2184 - 2184
  • [9] MODELING AND OPTIMIZATION OF MONOLITHIC POLYCRYSTALLINE SILICON RESISTORS
    LU, NCC
    GERZBERG, L
    LU, CY
    MEINDL, JD
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (07) : 818 - 830
  • [10] SILICON IN SUB-MICRON PARTICLES IN THE SOUTHWEST
    PITCHFORD, M
    FLOCCHINI, RG
    DRAFTZ, RG
    CAHILL, TA
    ASHBAUGH, LL
    ELDRED, RA
    ATMOSPHERIC ENVIRONMENT, 1981, 15 (03) : 321 - 333