首页
学术期刊
论文检测
AIGC检测
热点
更多
数据
EXPLANATION FOR THE TEMPERATURE INSENSITIVITY OF THE AUGER RECOMBINATION RATES IN 1.55 MU-M INP-BASED STRAINED-LAYER QUANTUM-WELL LASERS
被引:23
|
作者
:
SEKI, S
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi, Kanagawa, 243-01
SEKI, S
LUI, WW
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi, Kanagawa, 243-01
LUI, WW
YOKOYAMA, K
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi, Kanagawa, 243-01
YOKOYAMA, K
机构
:
[1]
NTT Opto-electronics Laboratories, Atsugi, Kanagawa, 243-01
来源
:
APPLIED PHYSICS LETTERS
|
1995年
/ 66卷
/ 23期
关键词
:
D O I
:
10.1063/1.113406
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
We study the temperature sensitivity of the Auger recombination rates in 1.55 μm InP-based strained-layer (SL) quantum-well (QW) lasers on the basis of the band structures obtained by the self-consistent numerical solution of the Poisson equation, the scalar effective-mass equation for the conduction band, and the multiband effective mass equation for the valence band. The results of the theoretical analysis are then compared with the recent experimental results to clarify the basic physical mechanism which determines the Auger recombination rates in SL-QW lasers. It is shown that the recent temperature sensitivity measurements of Auger recombination coefficients can be consistently explained in terms of the direct band-to-band Auger process in the quasi-two-dimensional system. We demonstrate that the Auger recombination process in 1.55 μm InP-based SL-QW lasers is mainly dominated by the direct band-to-band Auger process regardless of QW structures in the temperature range of 273-398 K.© 1995 American Institute of Physics.
引用
收藏
页码:3093 / 3095
页数:3
相关论文
共 50 条
[1]
DOMINANT MECHANISMS FOR THE TEMPERATURE SENSITIVITY OF 1.3 MU-M INP-BASED STRAINED-LAYER MULTIPLE-QUANTUM-WELL LASERS
SEKI, S
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi, Kanagawa, 243-01
SEKI, S
OOHASI, H
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi, Kanagawa, 243-01
OOHASI, H
SUGIURA, H
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi, Kanagawa, 243-01
SUGIURA, H
HIRONO, T
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi, Kanagawa, 243-01
HIRONO, T
YOKOYAMA, K
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi, Kanagawa, 243-01
YOKOYAMA, K
APPLIED PHYSICS LETTERS,
1995,
67
(08)
: 1054
-
1056
[2]
THE EFFECTS OF STRAIN ON INTRASUBBAND SCATTERING RATES IN INP-BASED STRAINED-LAYER QUANTUM-WELL LASERS
SEKI, S
论文数:
0
引用数:
0
h-index:
0
机构:
OHIO STATE UNIV, DEPT ELECT ENGN, COLUMBUS, OH 43210 USA
OHIO STATE UNIV, DEPT ELECT ENGN, COLUMBUS, OH 43210 USA
SEKI, S
YOKOYAMA, K
论文数:
0
引用数:
0
h-index:
0
机构:
OHIO STATE UNIV, DEPT ELECT ENGN, COLUMBUS, OH 43210 USA
OHIO STATE UNIV, DEPT ELECT ENGN, COLUMBUS, OH 43210 USA
YOKOYAMA, K
SOTIRELIS, P
论文数:
0
引用数:
0
h-index:
0
机构:
OHIO STATE UNIV, DEPT ELECT ENGN, COLUMBUS, OH 43210 USA
OHIO STATE UNIV, DEPT ELECT ENGN, COLUMBUS, OH 43210 USA
SOTIRELIS, P
JOURNAL OF APPLIED PHYSICS,
1994,
76
(11)
: 7399
-
7404
[3]
HIGH-TEMPERATURE OPERATION OF 1.3 MU-M GAINASP/INP GRINSCH STRAINED-LAYER QUANTUM-WELL LASERS
NAMEGAYA, T
论文数:
0
引用数:
0
h-index:
0
机构:
Yokohama R&D Laboratories, The Furukawa Electric Co., Ltd., Yokohama 220, 2-4-3, Okano, Nishi-ku
NAMEGAYA, T
KASUKAWA, A
论文数:
0
引用数:
0
h-index:
0
机构:
Yokohama R&D Laboratories, The Furukawa Electric Co., Ltd., Yokohama 220, 2-4-3, Okano, Nishi-ku
KASUKAWA, A
IWAI, N
论文数:
0
引用数:
0
h-index:
0
机构:
Yokohama R&D Laboratories, The Furukawa Electric Co., Ltd., Yokohama 220, 2-4-3, Okano, Nishi-ku
IWAI, N
KIKUTA, T
论文数:
0
引用数:
0
h-index:
0
机构:
Yokohama R&D Laboratories, The Furukawa Electric Co., Ltd., Yokohama 220, 2-4-3, Okano, Nishi-ku
KIKUTA, T
ELECTRONICS LETTERS,
1993,
29
(04)
: 392
-
393
[4]
Critical temperature of 1.3 mu m InP-based strained-layer multiple-quantum-well lasers
Seki, S
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi, Kanagawa 243-01
Seki, S
Yokoyama, K
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi, Kanagawa 243-01
Yokoyama, K
APPLIED PHYSICS LETTERS,
1997,
71
(18)
: 2683
-
2685
[5]
ELECTROSTATIC DEFORMATION IN BAND PROFILES OF INP-BASED STRAINED-LAYER QUANTUM-WELL LASERS
SEKI, S
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi, Kanagawa 243-01
SEKI, S
YOKOYAMA, K
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi, Kanagawa 243-01
YOKOYAMA, K
JOURNAL OF APPLIED PHYSICS,
1995,
77
(10)
: 5180
-
5184
[6]
Study on the dominant mechanisms for the temperature sensitivity of threshold current in 1.3-mu m InP-based strained-layer quantum-well lasers
Seki, S
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi
Seki, S
Oohashi, H
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi
Oohashi, H
Sugiura, H
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi
Sugiura, H
Hirono, T
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi
Hirono, T
Yokoyama, K
论文数:
0
引用数:
0
h-index:
0
机构:
NTT Opto-electronics Laboratories, Atsugi
Yokoyama, K
IEEE JOURNAL OF QUANTUM ELECTRONICS,
1996,
32
(08)
: 1478
-
1486
[7]
HIGH-PERFORMANCE LAMBDA= 1.3 MU-M INGAASP-INP STRAINED-LAYER QUANTUM-WELL LASERS
THIJS, PJA
论文数:
0
引用数:
0
h-index:
0
机构:
Philips Optoelectronics Centre, 5600 JA Eindhoven
THIJS, PJA
VANDONGEN, T
论文数:
0
引用数:
0
h-index:
0
机构:
Philips Optoelectronics Centre, 5600 JA Eindhoven
VANDONGEN, T
TIEMEIJER, LF
论文数:
0
引用数:
0
h-index:
0
机构:
Philips Optoelectronics Centre, 5600 JA Eindhoven
TIEMEIJER, LF
BINSMA, JJM
论文数:
0
引用数:
0
h-index:
0
机构:
Philips Optoelectronics Centre, 5600 JA Eindhoven
BINSMA, JJM
JOURNAL OF LIGHTWAVE TECHNOLOGY,
1994,
12
(01)
: 28
-
37
[8]
Critical temperature of 1.3 μm InP-based strained-layer multiple-quantum-well lasers
Seki, Shunji
论文数:
0
引用数:
0
h-index:
0
Seki, Shunji
Yokoyama, Kiyoyuki
论文数:
0
引用数:
0
h-index:
0
Yokoyama, Kiyoyuki
Applied Physics Letters,
1997,
71
(18):
[9]
INGAAS/INGAASP/INP STRAINED-LAYER QUANTUM-WELL LASERS AT SIMILAR-TO-2-MU-M
FOROUHAR, S
论文数:
0
引用数:
0
h-index:
0
机构:
AT&T BELL LABS,MURRAY HILL,NJ 07974
AT&T BELL LABS,MURRAY HILL,NJ 07974
FOROUHAR, S
KSENDZOV, A
论文数:
0
引用数:
0
h-index:
0
机构:
AT&T BELL LABS,MURRAY HILL,NJ 07974
AT&T BELL LABS,MURRAY HILL,NJ 07974
KSENDZOV, A
LARSSON, A
论文数:
0
引用数:
0
h-index:
0
机构:
AT&T BELL LABS,MURRAY HILL,NJ 07974
AT&T BELL LABS,MURRAY HILL,NJ 07974
LARSSON, A
TEMKIN, H
论文数:
0
引用数:
0
h-index:
0
机构:
AT&T BELL LABS,MURRAY HILL,NJ 07974
AT&T BELL LABS,MURRAY HILL,NJ 07974
TEMKIN, H
ELECTRONICS LETTERS,
1992,
28
(15)
: 1431
-
1432
[10]
MEASUREMENT OF NONRADIATIVE AUGER AND RADIATIVE RECOMBINATION RATES IN STRAINED-LAYER QUANTUM-WELL SYSTEMS
WANG, MC
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801
UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801
WANG, MC
KASH, K
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801
UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801
KASH, K
ZAH, CE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801
UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801
ZAH, CE
BHAT, R
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801
UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801
BHAT, R
CHUANG, SL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801
UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801
CHUANG, SL
APPLIED PHYSICS LETTERS,
1993,
62
(02)
: 166
-
168
←
1
2
3
4
5
→