IMPROVING RESOLUTION BY USING PHASE IN MICROLITHOGRAPHY MASKS

被引：0
|
作者：
LEVENSON, MD [1 ]
SANTINI, H [1 ]
VISWANATHAN, V [1 ]
GOODMAN, D [1 ]
机构：
[1] IBM CORP,RES LAB,SAN JOSE,CA 95193
来源：
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA | 1982年 / 72卷 / 12期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
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页码：1827 / 1827
页数：1
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