DAMAGE TO SHALLOW N+/P AND P+/N JUNCTIONS BY CHF3+CO2 REACTIVE ION ETCHING

被引：23
|
作者：
WU, IW
STREET, RA
MIKKELSEN, JC
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 05期
关键词：
D O I：
10.1063/1.339949
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：1628 / 1635
页数：8
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