ROLE OF TEMPORAL DELAY IN DUAL-LASER ABLATED PLUMES

被引:30
|
作者
WITANACHCHI, S
MUKHERJEE, P
机构
[1] Department of Physics, University of South Florida, Tampa
关键词
D O I
10.1116/1.579856
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A novel laser ablation process using two lasers of different wavelengths has demonstrated the capacity to grow essentially particulate-free thin films without compromising the ionic excitation and kinetic energy of the plume species. We demonstrate in this article, the critical role of the interpulse delay when a pulsed CO2 laser spatially overlaps an excimer (KrF) laser on the ablation target during this dual-laser ablation process. At the optimum delay, the excitation and the ionization of the plume were significantly enhanced. The time-of-flight ion probe studies indicate more than a fourfold increase in the ion kinetic energies for this optimized process in comparison to the single-laserablated plumes. The choice of a suitable delay also facilitates an optimization of elimination of particulate ejection that is typical of single-laser ablation. The morphology of the dual-laser ablated Er-doped Y2O3 films deposited on Si substrates as a function of interpulse delay is also discussed. © 1995, American Vacuum Society. All rights reserved.
引用
收藏
页码:1171 / 1174
页数:4
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