DOPING PROPERTIES OF RHODIUM AND IRIDIUM IN SILICIUM

被引：9

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作者：

LEMKE, H

机构：

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1985年 / 91卷 / 01期

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D O I：

10.1002/pssa.2210910119

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T [工业技术];

学科分类号：

08 ;

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页码：143 / 152

页数：10

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