A STEP-AND-REPEAT X-RAY-EXPOSURE SYSTEM FOR 0.5-MU-PATTERN REPLICATION

被引：13
|
作者：
HAYASAKA, T
ISHIHARA, S
KINOSHITA, H
TAKEUCHI, N
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 06期
关键词：
D O I：
10.1116/1.582942
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1581 / 1586
页数：6
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    [J]. BULLETIN OF THE JAPAN SOCIETY OF PRECISION ENGINEERING, 1982, 16 (03): : 197 - 198
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  • [10] SUB-0.15 MU-M PATTERN REPLICATION USING A LOW-CONTRAST X-RAY MASK
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