ELECTRON-BEAM MIXING W1-XSIX/SI MULTILAYERS

被引：0
|
作者：
VAVRA, I
WALLENBERG, LR
KUDRYASHOV, VA
机构：
[1] NATL CTR HREM,CTR CHEM,S-22100 LUND,SWEDEN
[2] INST MICROELECTR PROBLEMS,CHERNOGOLOVKA 142432,RUSSIA
来源：
VACUUM | 1995年 / 46卷 / 8-10期
关键词：
D O I：
10.1016/0042-207X(95)00107-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The high energy electron beam was used for the local amorphisation of metallic multilayer. The observed effect is proposed for the application in nanometer-scale technology.
引用
收藏
页码：1063 / 1064
页数：2
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