HIGH-CAPACITY SPUTTERING APPARATUS FOR HYBRID MICROWAVE INTEGRATED-CIRCUITS PRODUCTION

被引：2
|
作者：
FERRARIS, GP [1 ]
机构：
[1] GEIPIPARI TUDONAYOS EGYESULET,ADV TECHNOL DIV CASSINA DE PECCHI,MILAN,ITALY
来源：
THIN SOLID FILMS | 1974年 / 24卷 / 01期
关键词：
D O I：
10.1016/0040-6090(74)90256-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：113 / 124
页数：12
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