IMPROVEMENT OF ELECTROSTATIC LENSES FOR ION-BEAM LITHOGRAPHY

被引:20
|
作者
SZILAGYI, M
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期
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D O I
10.1116/1.582651
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:1137 / 1140
页数:4
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