Research on Growth and Physical Properties of N delta-doped Cu2O Films

被引:0
|
作者
Li Wei [1 ]
Pan Jingxin [1 ]
Wang Dengkui [1 ]
Fang Xuan [1 ]
Fang Dan [1 ]
Wang Xinwei [1 ]
Tang Jilong [1 ]
Wang Xiaohua [1 ]
Sun Xiuping [2 ]
机构
[1] Changchun Univ Sci & Technol, State Key Lab High Power Semicond Laser, Changchun 130022, Jilin, Peoples R China
[2] Changchun Univ Sci & Technol, Coll Sci, Changchun 130012, Jilin, Peoples R China
来源
关键词
materials; plasma enhanced atomic layer deposition; N delta-doping; Cu2O films; NH3 doping source;
D O I
10.3788/CJL201845.0103003
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
By the plasma enhanced atomic layer deposition (PEALE) technique, the N delta-doped Cu2O films are prepared with NH3 as the doping source. The effects of N-doping on the surface morphology, optical and electrical properties of Cu2O films are studied. The study results show that the N-doping causes the lattice distortion and the surface roughness of the N delta-doped Cu2O thin films increases. The bandgap width of the N delta-doped Cu2O thin films increases from 2.70 eV to 3.20 eV, and the absorption edge becomes steep. The carrier concentration of the doped sample is 6.32 x 10(19) cm(-3), enhanced by one order of magnitude comparing with that of the un-doped samples (5.77x10(18) cm(-3))
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页数:5
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