VOLTAGE CONTRAST ISOLATION BY FRAME-BY-FRAME DIGITAL PROCESSING IN THE STROBOSCOPIC SEM

被引：0
|
作者：
FUJIOKA, H [1 ]
TSUJITAKE, M [1 ]
URA, K [1 ]
机构：
[1] OSAKA UNIV,FAC ENGN,ELECTRON BEAM LAB,SUITA,OSAKA 565,JAPAN
来源：
JOURNAL OF ELECTRON MICROSCOPY | 1982年 / 31卷 / 03期
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中图分类号：
TH742 [显微镜];
学科分类号：
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页码：285 / 285
页数：1
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