CHEMICAL VAPOR-DEPOSITION OF RUTHENIUM AND RUTHENIUM DIOXIDE FILMS

被引：237
|
作者：
GREEN, ML
GROSS, ME
PAPA, LE
SCHNOES, KJ
BRASEN, D
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 11期
关键词：
D O I：
10.1149/1.2113647
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：2677 / 2685
页数：9
相关论文
共 50 条
  • [1] CHEMICAL VAPOR-DEPOSITION OF RUTHENIUM
    GROSS, ME
    PAPA, LE
    GREEN, ML
    SCHNOES, KJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (03) : C88 - C88
  • [2] CHEMICAL VAPOR-DEPOSITION (CVD) OF RUTHENIUM AND RUTHENIUM DIOXIDE THIN-FILMS USING HEXAFLUORO-2-BUTYNETETRACARBONYLRUTHENIUM (0)
    SENZAKI, Y
    GLADFELTER, WL
    MCCORMICK, FB
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1993, 205 : 93 - INOR
  • [3] Chemical vapor deposition of ruthenium dioxide films from organometallic precursors
    Atkinson, K
    Meda, L
    Kirss, RU
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1998, 216 : U23 - U23
  • [4] Ruthenium complexes as precursors for chemical vapor-deposition (CVD)
    Gaur, Ruchi
    Mishra, Lallan
    Siddiqi, M. Aslam
    Atakan, Burak
    RSC ADVANCES, 2014, 4 (64) : 33785 - 33805
  • [5] Chemical vapor deposition of ruthenium dioxide thin films from bis(2,4-dimethylpentadienyl)ruthenium
    Meda, L
    Breitkopf, RC
    Haas, TE
    Kirss, RU
    CHEMICAL ASPECTS OF ELECTRONIC CERAMICS PROCESSING, 1998, 495 : 75 - 80
  • [6] Epitaxial growth of ruthenium dioxide films by chemical vapor deposition and its comparison with similarly grown chromium dioxide films
    Miao, GX
    Gupta, A
    Xiao, G
    Anguelouch, A
    THIN SOLID FILMS, 2005, 478 (1-2) : 159 - 163
  • [7] Characteristics of ruthenium films prepared by chemical vapor deposition using bis(ethylcyclopentadienyl) ruthenium precursor
    Matsui, Y
    Hiratani, M
    Nabatame, T
    Shimamoto, Y
    Kimura, S
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2002, 5 (01) : C18 - C21
  • [8] CHEMICAL VAPOR-DEPOSITION OF THIN-FILMS OF RUTHENIUM AND FORMATION OF AN UNEXPECTED BY-PRODUCT USING HEXAFLUORO-2-BUTYNETETRACARBONYL-RUTHENIUM(0)
    SENZAKI, Y
    MCCORMICK, FB
    GLADFELTER, WL
    CHEMISTRY OF MATERIALS, 1992, 4 (04) : 747 - 749
  • [9] Platinum, ruthenium and ruthenium dioxide electrodes deposited by metal organic chemical vapor deposition for oxide applications
    Baumann, PK
    Doppelt, P
    Fröhlich, K
    Gueroudji, L
    Cambel, V
    Machajdik, D
    Schumacher, M
    Lindner, J
    Schienle, F
    Burgess, D
    Strauch, G
    Juergensen, H
    Guillon, H
    Jimenez, C
    INTEGRATED FERROELECTRICS, 2002, 44 : 135 - 142
  • [10] Chemical vapor deposition of amorphous ruthenium-phosphorus alloy films
    Shin, Jinhong
    Waheed, Abdul
    Winkenwerder, Wyatt A.
    Kim, Hyun-Woo
    Agapiou, Kyriacos
    Jones, Richard A.
    Hwang, Gyeong S.
    Ekerdt, John G.
    THIN SOLID FILMS, 2007, 515 (13) : 5298 - 5307
12345