THERMAL-STABILITY OF AL-SI/TISI2/SI SCHOTTKY DIODES

被引：8
|
作者：
CHEN, DC
MERCHANT, P
AMANO, J
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期
关键词：
D O I：
10.1116/1.573291
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：709 / 713
页数：5
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