Silicon Nanofabrication by Atomic Force Microscopy-Based Mechanical Processing

被引:13
|
作者
Miyake, Shojiro [1 ]
Wang, Mei [2 ]
Kim, Jongduk [3 ]
机构
[1] Nippon Inst Technol, Dept Innovat Syst Engn, Saitama 3458501, Japan
[2] R&D OSG Corp, Honnogahara 1-15, Toyokawa 4428544, Japan
[3] Pk Syst Japan Inc, Chiyoda Ku, Tokyo 1010054, Japan
关键词
D O I
10.1155/2014/102404
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This paper reviews silicon nanofabrication processes using atomic force microscopy (AFM). In particular, it summarizes recent results obtained in our research group regarding AFM-based silicon nanofabrication through mechanochemical local oxidation by diamond tip sliding, as well as mechanical, electrical, and electromechanical processing using an electrically conductive diamond tip. Microscopic three-dimensional manufacturing mainly relies on etching, deposition, and lithography. Therefore, a special emphasis was placed on nanomechanical processes, mechanochemical reaction by potassium hydroxide solution etching, and mechanical and electrical approaches. Several important surface characterization techniques consisting of scanning tunneling microscopy and related techniques, such as scanning probe microscopy and AFM, were also discussed.
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页数:19
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