A BILEVEL RESIST FOR ION-BEAM LITHOGRAPHY

被引：5
|
作者：
MILGRAM, A
PURETZ, J
机构：
[1] TEKTRONIX INC,BEAVERTON,OR 97077
[2] OREGON GRAD CTR,BEAVERTON,OR 97006
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 03期
关键词：
D O I：
10.1116/1.583074
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：879 / 883
页数：5
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