POSITION AND PRESSURE EFFECTS IN RF-MAGNETRON REACTIVE SPUTTER DEPOSITION OF PIEZOELECTRIC ZINC-OXIDE

被引：102
|
作者：
KRUPANIDHI, SB
SAYER, M
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 11期
关键词：
D O I：
10.1063/1.333895
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：3308 / 3318
页数：11
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